Cudeposition

Författare/Upphovsman:

Knordlun

Kreditera:

Eget arbete

Kort länk:

https://www.sewiki.info/b/4d49e

Källa:

Wikimedia Commons

Upplösning:

320 x 380 Pixel (685411 Bytes)

Beskrivning:

Molecular dynamics computer simulation of the deposition of a single copper atom with

a kinetic energy of 1 eV on a copper surface. Technical details: cross section of two atom layers in the middle of a larger (10x10x10 unit cells) 3D simulation cell. Simulation made with Sabochick-Lam embedded-atom method potential, Berendsen temperature control used only at the outer boundaries to scale temperature down to 0 K. Initial temperature 0 K (cell prerelaxed to allow for surface relaxation inwards). This kind of processes occur in reality during physical vapour deposition.

Licens:

Public domain